Reuters reports that Chinese scientists in Shenzhen have built a prototype extreme ultraviolet (EUV) lithography machine — the class of tool required to manufacture the most advanced semiconductors used in AI, smartphones and modern defence systems. Sources say the prototype was completed in early 2025, is generating EUV light and is now undergoing testing, but has not yet produced working chips. China’s internal target is 2028; sources closer to the effort suggest 2030 is more realistic.
If confirmed, it would indicate faster-than-expected progress toward semiconductor self-sufficiency despite years of export controls aimed at limiting access to EUV and related equipment. The report also highlights the remaining bottlenecks: replicating the precision optics and achieving the reliability and contamination control needed for production-grade chipmaking. For global technology leaders, the strategic takeaway is clear — the semiconductor supply chain is increasingly shaped by resilience planning, sovereignty objectives and long-horizon geopolitical competition.
